This chemical fluid dispensing pump (CFD) is designed to handle wafer liquid of enhanced purity
The resolution of CFD has been greatly improves compared to our existing models. The minimum flow of 1mL/shot offers greate accuracy in chemical condensation control that is required in the wafer cleaning process. The anti-siphon mechanism prevents unintentional siphoning.
Corrosion resistant wet ends
Fluoroplastic wet ends (PTFE, PFA, PTCFE) is capable of handling the strong acids, alkaline and hydrogen peroxide required for semiconductor processing. PFTE, PFA, PP, PVC external parts and PTFE coated screws provide additional protection against chemical attack.
Flow rate adjustment
Simply open the bottom cover to easily adjust stroke length to give between 1.0-2.7ml/shot. (Factory default is 1.0ml/shot)
We offer customised training at your offices or onsite. Our goal is to maximise the efficiency for your engineering team during troubleshooting, minimising downtime. We concentrate on installation, product connectivity, and maintenance. For more information, please contact us and outline your team's specific needs.
Virtual training
In a fast-paced environment, we recognise the value of bite-sized training, especially when project teams are dispersed onsite or across different locations. To minimise time away from facilities, we provide intensive product training through video conferencing. For further details, please contact us and outline your team's specific needs.