The Iwaki EWP-L is a simple function electromagnetic metering pump designed for reliable, accurate chemical dosing without unnecessary control complexity. With intuitive speed and stroke length adjustment, standard external pulse and 4–20 mA analogue control, compact dimensions and an IP66-rated housing, the EWP-L is well suited to practical dosing applications where dependable performance, easy operation and installation flexibility matter.
Simple control for everyday dosing applications
The EWP-L is designed for users who need reliable chemical dosing without complex display functions or advanced programming. Its simple control layout makes it easier for operators to adjust pump output using intuitive speed and stroke length knobs, helping reduce unnecessary setup time and operational confusion.
Proportional control without over-complication
External pulse and 4–20 mA analogue control are standard across EWP-L models, making the pump suitable for applications where dosing needs to respond to a signal from a controller, meter or wider treatment system. This gives users practical control capability without moving into a more advanced pump than the application requires.
Compact, flexible installation
The EWP series is designed to fit into a variety of installation locations, including space-constrained dosing panels, cabinets and skids. Optional wall-mount/base and control covers are available for the EWP-L, giving system builders and maintenance teams more flexibility when integrating the pump into new or existing dosing setups.
Durable design for demanding environments
With an IP66-rated housing, the EWP-L is designed to provide protection against water and dust ingress. This makes it a practical choice for industrial and water treatment environments where dosing equipment may be exposed to challenging installation conditions.
Broad chemical compatibility options
The EWP range is available with a selection of wet-end materials, including PVC, GFRPP, PVDF and SUS316, helping users match the pump construction to the chemical being dosed and the demands of the application.